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Advanced Engineering Materials Limited
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Oxide Targets (Ceramic Sputtering Targets)

Oxide Targets (Ceramic Sputtering Targets)

Country/Region china
Company Advanced Engineering Materials Limited
Categories Tungsten Copper Alloy
Update 2019-07-13 16:34:30
ICP License Issued by the Chinese Ministry
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Oxide ceramic sputtering targets are the most common ones among advanced ceramic sputtering targets. Oxide ceramics can be made by sintering at high temperature with one or more oxides being the main principal components and other minor oxides being the additives. They are divided into simple oxide ceramics and complex oxide ceramics.

AEM Deposition is a leading ceramic sputtering targets manufacturer from China, we supply high quality Al2O3, SiO2, Nb2Ox, TiOx, ITO, AZO, YSZ, IGZO, etc sputtering targets for our clients, as well as many other Oxide sputtering targets. Most oxide ceramics bear a high melting point, excellent insulation, heat strength, resistance to oxidants and corrosion.

Therefore, they can be exposed to hyperthermal and oxidative environment for a long time and deserve their wide application in the engineering field. One imperfection to overcome is their susceptibility to plastic deformation at high temperature, making themselves unsuitable for using as high-temperature structural materials.

Our sputtering targets have such advantages: uniform color, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants.

Sintering technology are used to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1"" to 14"" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size.

As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium, or elastomer, hence the targets' service time will be longer. AEM Deposition provides in-house sputtering target bonding services, you can click this link: Target Bonding to know more details.


Sintering technology are used to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium, or elastomer, hence the targets' service time will be longer. AEM Deposition provides in-house sputtering target bonding services, you can click this link: Target Bonding to know more details.
AEM Deposition enjoys a very strong reputation by its excellent performance. We provides each sputtering target ships complete with a Certificate of Analysis and SDS. You can click the "details" to get more information. We also provides Special Tailor-Made Targets for our client. Customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve the longer life for targets and desired characteristics of sputtering deposited thin film. If you can't find the sputtering target you need in the list, please contact sales@aemdeposition.com or 86-731-89578196 for your custom R&D or production materials needs.
For a listing of Frequently Asked Questions (FAQs) about Sputtering Targets, please see this link: Sputtering Targets FAQ.


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