Alloy sputtering targets are materials composed of one metal and
other metals or non-metals while still showing the some metallic
characteristics. Alloys are generally considered to be metallic in
nature i.e. they have good thermal and electrical conductivities.
Alloy is usually obtained by fusing the respective molten
components and cooling from high temperature to become condensates.
Most alloys are mixtures rather than pure chemical substance but
each ingredient in the alloy still remains its own chemical
properties.Alloys can be manufactured by various routes, the most
widely used being to melt the constituents together and to cool the
resultant mixture to form a single or multi-phase solid. According
to the number of elements contained, alloy sputtering target is
categorized into binary alloy, ternary alloy and multicomponent
alloy. Alloys have much more extensive and important industrial
applications than pure metals, so people seldom use pure metals but
alloys instead in daily life. Alloy sputtering targets share
several traits with pure metal sputtering targets, including
crystal structure under the solid state, special metallic luster,
opacity, and fine electric conductivity, thermal conductivity and
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AEM Deposition as a target supplier, also provides Special Tailor-Made Targets for our client. Customized target products made of high purity raw
material powder with super fine grain size, together with the
distinguished homogeneous microstructure to achieve the longer life
for targets and desired characteristics of sputtering deposited
thin film. If you can't find the sputtering target you need in the
list, please contact email@example.com or 86-731-89578196 for your custom R&D or production materials needs.
We also provide in-house sputter target bonding services, you can
click this link: Target Bonding to know more details.
For a listing of Frequently Asked Questions (FAQs) about Sputtering
Targets, please see this link: Sputtering Targets FAQ.
Alloy Targets Images