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| Categories | Sputtering Targets | 
|---|---|
| Brand Name: | JINXING | 
| Model Number: | Zirconium Sputtering Target | 
| Certification: | ISO 9001 | 
| Place of Origin: | China | 
| MOQ: | 1kg | 
| Price: | 20~100USD/kg | 
| Payment Terms: | L/C, D/A, D/P, T/T, Western Union | 
| Supply Ability: | 100000kgs/M | 
| Delivery Time: | 10~25 work days | 
| Packaging Details: | Plywood case | 
| Material: | Zirconium Zr702 | 
| Process: | HIP , CIP | 
| Size: | Customized | 
| Application: | PVD Coating | 
| Density: | 6.506g/cm3 | 
| Shape: | Round , Plate , Tube Sputtering target | 
| Grain Size: | Fine Grain Size | 
| Purity: | 99.5% , 99.95% | 
| Company Info. | 
| JINXING MATECH CO LTD | 
| View Contact Details | 
| Product List | 
Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.
Description
JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target and Evaporation material . Material incluidng ( Ti Titanium, TiAl, TiSi, TiZr , Zr Zirconium , Cr Chrome, Mo, W Tungsten, WTi , Cu, Ni, Ta, Nb ) .
JINXING has developed a complete line of rotary cathode sputtering targets. Materials are either continuously cast, extruded, HIP'ed or plasma sprayed to provide technological advances in rotary design. In addition, unique profiles can be developed for specific applications to provide targets for better wear characterization, longer life, unique physical characteristics or altered metallurgical properties.
Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.
| Grades: | R60702, 99.2%min | 
| Purity: 99.5% | |
| Purity: 99.95% Hf<300ppm or Hf<4.5%) | |
| Shape: | Round Shape , Tube Shape and Plate Shape. | 

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 Fine Grain Size Tungsten Sputtering Target With Hip / Cip / Forge Process
                                                                                        
                                                        
                        
                        
                        
                                                            Fine Grain Size Tungsten Sputtering Target With Hip / Cip / Forge Process
                                                    
                        
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                     Chromium Sheets / Pieces Sputtering Targets With 7.19g/Cm3 Density
                                                                                        
                                                        
                        
                        
                        
                                                            Chromium Sheets / Pieces Sputtering Targets With 7.19g/Cm3 Density
                                                    
                        
                     Titanium Silicon Alloy Metal Sputtering Targets With Excellent Oxidation Resistance
                                                                                        
                                                        
                        
                        
                        
                                                            Titanium Silicon Alloy Metal Sputtering Targets With Excellent Oxidation Resistance
                                                    
                        
                     Copper Rotatable Sputtering Target High Density With Smooth Surface
                                                                                    
                        
                        
                        
                                                            Copper Rotatable Sputtering Target High Density With Smooth Surface
                                                    
                        
                     Customized Size Sputtering Targets 6N Electrolytic Grade Copper Granular Evaporation Material
                                                                                    
                        
                        
                        
                                                            Customized Size Sputtering Targets 6N Electrolytic Grade Copper Granular Evaporation Material
                                                    
                        
                     Copper Plate Sputtering Target Ultra High Purity 99.999%, 99.9999%
                                                                                        
                                                        
                        
                        
                        
                                                            Copper Plate Sputtering Target Ultra High Purity 99.999%, 99.9999%
                                                    
                        
                     Titanium Sputter Target High Purity Fine Grain Size 4.52 G/Cm3
                                                                                    
                        
                        
                        
                                                            Titanium Sputter Target High Purity Fine Grain Size 4.52 G/Cm3
                                                    
                        
                     High Purity 99.5% Titanium Sputtering Target For Pvd Coating System
                                                                                        
                                                        
                        
                        
                        
                                                            High Purity 99.5% Titanium Sputtering Target For Pvd Coating System