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| Categories | Optical Coating Equipment |
|---|---|
| Brand Name: | Zeit Group |
| Model Number: | ALD1200-500 |
| Certification: | NA |
| Place of Origin: | CHENGDU.P.R CHINA |
| MOQ: | 1 |
| Payment Terms: | T/T |
| Supply Ability: | 1 set within 8 month |
| Delivery Time: | Delivery within 8 months after signing the contract |
| Packaging Details: | Wooden case packing |
| product name: | Self-developed high-end optical coating equipment |
| model: | ALD1200-500 |
| application area: | MEMS device,3D packaging，sensor，Medical |
| Working principle: | Atomiclayer deposition (ALD) is a method by which a substance can be deposited on a substrate layer by layer in the form of a single atomic film. |
| Vacuum chamber structure: | Customized according to customer needs |
| Thickness control accuracy: | ±0.1nm |
| Uniformity of film thickness: | ≦±0.5% |
| Coating temperature range: | Normal temperature-500℃ |
| Company Info. |
| ZEIT Group |
| View Contact Details |
| Product List |
Self-developed high-end optical coating equipment with 1200mm*500mm(customized)
Working principle
Atomiclayer deposition (ALD) is a method by which a substance can be deposited on a substrate layer by layer in the form of a single atomic film.
Specification parameter
| model | ALD1200-500 |
| Coating film system | AL2O3,TiO2,ZnO and etc. |
| Coating temperature range | Normal temperature-500℃ |
| Coating vacuum chamber dimensions | Inner diameter 1200mm, height 500mm(customizable) |
| Vacuum chamber structure | Customized according to customer needs |
| Background vacuum | <5X10-7mbar |
| Coating thickness | ≥0.15nm |
| Thickness control accuracy | ±0.Inm |
Application Area
| MEMS device |
| Electroluminescent plate |
| display |
| Storage material |
| Inductive coupling |
| Perovskite thin film battery |
| 3D packaging |
| Luminescence application |
| sensor |
| Carp battery |
ALD technology Advantages
①The precursor is saturated chemisorption, which ensures the formation of a large area uniform film.
②Multi-component nanosheets and mixed oxides can be deposited.
③Inherent deposition uniformity, easy scaling, can be directly scaled up.
④Can be widely applied to various shapes of the base.
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