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High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%

Categories Tantalum Parts
Brand Name: PRM
Model Number: custom
Certification: ISO9001
Place of Origin: China
MOQ: 1pc
Price: Negotiate
Payment Terms: T/T, L/C
Supply Ability: 5000kgs/month
Delivery Time: 7~10 work days
Packaging Details: Plywood case
Name: Tantalum sputter coating target
Grade: RO5200,RO5400,RO5252,RO5255,Ta1,Ta2
Purity: 99.95% 99.99%
Shape: Disc & Plate
Size: As per customer's drawing
Density: 16.75g/cm3
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High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%

High Purity Sputter Coating Tantalum Target Tantalum Disc Target


1. Specifications Of Sputter Coating Tantalum Target:


Sputter Coating Tantalum Target


Material: R05200, R05400, R05252 (Ta-2.5W), R05255 (Ta-10W)

Circular targets: Dia 25mm ~ 400mm x Thickness 3mm ~ 28mm

Rectangular targets: Thickness 1mm ~ 12.7mm x Width < 600mmx Length < 2000mm

Purity: >=99.95% or 99.99%

Surface: bright,polished

Condition: annealed


We can also process according to your request.


Grade3N, 3N5, 4N, with Ta 99.99%min
Recrystallization95%min
Grain sizeASTM 4 or finer
Surface finish16Rms max. or Ra 0.4 ( RMS64 or better)
Flatness0.1mm or 0.15% max
Tolerance+/-0.010" on all dimensions


2. Chemical Composition Of Sputter Coating Tantalum Target:


GradeElement content(wt%)
CNOHFeSiNiTiMoWNbTa
Ta10.010.0050.0150.00150.0050.0050.0020.0020.010.010.05Remain
Ta20.020.0250.030.0050.030.020.0050.0050.030.040.1Remain
TaNb30.020.0250.030.0050.030.030.0050.0050.030.041.5~3.5Remain
TaNb200.020.0250.030.0050.030.030.0050.0050.020.0417~23Remain
TaNb400.010.010.020.00150.010.0050.010.010.020.0535~42Remain
TaW2.50.010.010.0150.00150.010.0050.010.010.022.0~3.50.5Remain
TaW7.50.010.010.0150.00150.010.0050.010.010.026.5~8.50.5Remain
TaW100.010.010.0150.00150.010.0050.010.010.029.0~110.1Remain

3. Application Of Sputter Coating Tantalum Target:


Tantalum sputtering target is a tantalum sheet obtained through pressure processing. It has high chemical purity, small grain size, recrystallized structure and good consistency in three axes. It is mainly used in optical fibers, semiconductor wafers and integrated circuits. For sputter deposition coatings, tantalum targets can be used for cathode sputtering coatings, high vacuum getter active materials, etc., and are important materials for thin film technology.


4. Advantage of our Sputter Coating target:


- polised surface with high quality.
- uniform grain with densified microstructure ensures longer use time.

- professional after-sales service.




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