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PVD Metal Sputtering Target 100x40mm Decoration And Tool Coating

Categories Metal Sputtering Target
Brand Name: CSTY
Model Number: Gr.1 Zr
Certification: GB/T19001-2016/ISO9001:2015
Place of Origin: CHINA
MOQ: 100pcs
Price: $26.00 - $58.00/ Piece
Payment Terms: L/C, T/T, Western Union, MoneyGram,Paypal
Supply Ability: 100000 pieces per Month
Delivery Time: 15~20 work days
Packaging Details: wooden case,carton Packaging can be according to customer requirements.
Grain Size: <100um
Type: Sputtering Target
Technical: Rolling, Forged, CNC
Materials: Titanium
Material: Metal
Composition: Customized
Target Configuration: Single Or Multiple
Grade: Grade 1
Crystal Structure: Customized
Sputtering Method: DC or RF
Target Bonding: Indium, Elastomer, or Sputtering Targets
Target Backing: Copper, Ti-Al, Titanium, Customized
Application: Thin Film Deposition
Melting Point: Varies depending on the metal
Company Advantage: High efficiency, high presicion
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PVD Metal Sputtering Target 100x40mm Decoration And Tool Coating

Description


Titanium Sputtering Target — Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, titanium is lustrous and silvery-white in appearance. It has a melting point of 1660°C, a density of 4.5 g/cc, and a vapor pressure of 10⁻⁴ Torr at 1,453°C. It is a sturdy material that can be easily fabricated when heated.
With strong, lightweight characteristics and excellent corrosion resistance, titanium is ideal for ocean liner hulls, aircraft engines, and designer jewelry. As a biocompatible material, it is widely used in surgical tools and medical implants.
Titanium Sputtering Targets are generally evaporated in a vacuum and deposited as coatings for wear resistance, decorative, semiconductor, and optical applications.

Titanium Sputtering Targets (Ti Target)

Material: High purity (99.5%, 99.995%) Titanium Sputtering Target

Grade: Gr1, Gr2, Gr5/Ti6Al4V, Gr7 Titanium Sputtering Target

Standard: ASTM B381, ASTM B265, ASTM F67, ASTM F136

Shape: Discs, Rectangles, Custom Shapes Available

Application: Deposited film nitride as decorative thin film; deposited film oxidized to TiO₂ as beam splitter or insulator

Physical Properties

GradeTensile Strength (MPa-Min)Yield Strength (MPa-Min)Elongation (%)
Gr124017024
Gr234527520
Gr345038018
Gr455048315
Gr589582810
Gr740027518
Gr962048315
Gr1248334818
Gr23/Gr5-Eli79375910

Chemical Composition

GradeFe MaxO MaxN MaxC MaxH MaxPd MaxAl MaxVa MaxNi MaxMo Max
Gr10.20.180.030.080.015-----
Gr20.30.250.030.080.015-----
Gr30.30.350.050.080.015-----
Gr40.50.40.050.080.015-----
Gr50.40.20.050.080.015-5.5–6.73.5–4.5--
Gr70.30.250.030.080.0150.12–0.25----
Gr90.250.150.030.080.015-2.5–3.52.0–3.0--
Gr120.30.250.030.080.015-0.6–0.90.2–0.4--
Gr5Eli/Gr230.250.030.030.080.0125-5.5–6.53.5–4.5--

Ti: Balance

Application

Titanium Targets
Used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. It is a core material in integrated circuit production and usually requires >99.99% purity.

Aluminum Targets
Common in semiconductor and heat-resistant coating applications, also used in vehicles and electronics.

Copper Targets
Ideal for electrical conductivity applications such as electrodes, wiring, and films.

Tin Targets
Applied to enhance corrosion resistance of coated materials.

Zinc Targets
Used as corrosion barriers and in the production of cathodes, batteries, and paints.

Platinum, Silver, and Gold Targets
Precious metal sputtering targets offer chemical inertness and high conductivity for instrument and electrode applications.

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