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| Categories | Lab Grown Diamond Seeds |
|---|---|
| Brand Name: | Infi |
| Model Number: | JSD |
| Place of Origin: | Hunan, China |
| MOQ: | 1-1000PCS |
| Price: | To be negotiated |
| Payment Terms: | T/T |
| Supply Ability: | >1000PCS To be negotiated |
| Delivery Time: | 3-7 Work days |
| Packaging Details: | Plastic bag, opp box or requsted |
| Customized support: | OEM, ODM |
| Color: | Colorless |
| Orientation: | 4pt/100 |
| Application: | CVD seeds, research |
| Company Info. |
| Shaper Diamond Technology Co., Ltd |
| Verified Supplier |
| View Contact Details |
| Product List |
Product description:
Single crystal diamond CVD (chemical vapor deposition) refers to a
type of diamond that is produced using the CVD process. In this
process, a mixture of carbon-containing gases is decomposed under
controlled conditions, resulting in the formation of a single
crystal diamond layer on a substrate.
Single crystal diamond CVD is known for its exceptional hardness
and thermal conductivity, which makes it useful for a range of
industrial and scientific applications, such as cutting and
grinding tools, heat spreaders, and optical components.
CVD single crystal diamond properties:
Since CVD diamond does not contain any metal catalysts, its thermal stability is close to that of natural diamond. Like high temperature and high pressure artificially synthesized polycrystalline diamond, CVD diamond grains are also arranged in disorder, without brittle cleavage planes, so they are isotropic.
Using the microwave plasma-assisted chemical vapor deposition method (MPACVD), the microwave resonance system is used to break down the carbon-containing gas and corrosive gas at low and medium pressures to generate plasma, and the growth strategy of the single-crystal diamond crystal model is designed, so that the diamond crystal can be used Homoepitaxial growth is achieved in the 100 and 110 and 111 growth directions of the type IIb diamond seed crystal
Size Available:
| Suggested application | Sustrated/seeds for single crystal CVD growth |
| Crystal growth process: | CVD |
| Color: | Colorless |
| Available size : | 3x3x0.3 4x4x0.3 5x5x0.3 6x6x0.3 7x7x0.3 8x8x0.3 9x9x0.6 10x10x0.3 11x11x0.3 12x12x0.3 13x13x0.3 15x15x0.3 |
| Benefits: | The length, width and thickness are all positive tolerance, |
| There are no polycrystalline black spots, cracks under the 20x magnifying glass. | |
| The cutting is perfect without small missing corners. | |
| The stress distribution is uniform under the polarizer. | |
| Orientation: | 4pt/100 |
| Lateral Dimensions Measured | to smaller side |
| Edges | Laser Cut |
| Edge Orientation | <100> edges |
| Face Orientation | {100} faces |
| Lateral Tolerance: | L + W tolerance (0, +0.3 mm), thickness tolerance (0, +0.1mm). |
| Side 1, Roughness, Ra | Two sides polished, Ra < 20 nm One side polished, Unpolished |
| Boron Concentration [B]: | <0.05 ppm |
| Nitrogen Concentration: | < 20 ppm |
Product Image:
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