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2" Sapphire Wafer, Off C-Axis toward A-Plane 2°, 430 µm Thick, DSP/SSP

Categories Sapphire Wafer
Brand Name: zmsh
Place of Origin: China
Material: 99.999% Sapphire Crystal
Orientation: Off C-Axis to A-Plane 2°
Diameter: 2", 50.8mm
Bow: ≤20μm
Size: 2inch, 4inch, 6inch, 8inch
TTV: <5μm
Thickness: 430μm
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2" Sapphire Wafer, Off C-Axis toward A-Plane 2°, 430 µm Thick, DSP/SSP

2" Sapphire Wafer Off C-Axis toward A-plane ,Al₂O₃,430µm Thickness, DSP/SSP


This 2-inch sapphire wafer features ultra-precise Off C-Axis to A-Plane 2° and 99.999% (5N) purity, optimized for high-performance epitaxial growth and specialized optoelectronic applications. With a 430µm thickness and options for double-side polishing (DSP) or single-side polishing (SSP), the wafer delivers exceptional surface quality (Ra <0.3nm) and crystallographic consistency, making it ideal for GaN-based devices, laser systems, and research-grade substrates. Its controlled off-axis orientation reduces step-bunching defects during epitaxy, while the ultra-high purity ensures minimal impurity-driven performance degradation in sensitive applications like quantum optics and RF filters.





Key Features of 2'' Sapphire Wafer


Precision Off-Cut Orientation:

Off C-plane toward A-axis 2° , engineered to enhance epitaxial layer uniformity and reduce defects in GaN growth.


Ultra-High Purity:

99.999% (5N) Al₂O, with trace impurities (Fe, Ti, Si) <5ppm, critical for high-frequency and low-loss devices.


Submicron Surface Quality:

DSP/SSP options:

DSP: Ra <0.3nm (both sides), ideal for optical and laser applications.

SSP: Ra <0.5nm (front side), cost-effective for epitaxy.

TTV <5µm for uniform thin-film deposition.


Material Excellence:

Thermal Stability: Melting point ~2,050°C, suitable for MOCVD/MBE processes.

Optical Transparency: >90% transmission (400nm–4,000nm).

Mechanical Robustness: 9 Mohs hardness, resistant to chemical etching.


Research-Grade Consistency:

Dislocation density <300 cm², ensuring high yield for R&D and pilot production.





Applications


GaN Epitaxy:

LEDs/Laser Diodes: Blue/UV emitters with reduced threading dislocations.

HEMTs: High-electron-mobility transistors for 5G and radar.


Optical Components:

Laser Windows: Low scatter loss for CO₂ and UV lasers.

Waveguides: DSP wafers for integrated photonics.


Acoustic Wave Devices:

SAW/BAW Filters: Off-cut orientation improves frequency stability.


Quantum Technologies:

Single-Photon Sources: High-purity substrates for SPDC crystals.


Industrial Sensors:

Pressure/Temperature Sensors: Chemically inert covers for harsh environments.





Specifications


Parameter

Value

Diameter50.8mm (2") ±0.1mm
Thickness430µm ±10µm
Orientationoff C -Axis toward A plane 2°
Purity99.999% (5N Al₂O₃)
TTV<5µm
Bow/Warp<20µm



Q&A


Q1: Why choose a 2° off-cut instead of standard C-plane?
A1: The 2° off-cut suppresses step-bunching during GaN epitaxy, improving layer uniformity and reducing defects in high-brightness LEDs and laser diodes.


Q2: How does 5N purity impact RF device performance?
A2: 99.999% purity minimizes dielectric losses at high frequencies, critical for 5G filters and low-noise amplifiers.


Q3: Can DSP wafers be used for direct bonding?
A3: Yes. DSP’s <0.3nm roughness enables atomic-level bonding for heterogenous integration (e.g., sapphire-on-silicon).


Q4: What’s the advantage of 430µm thickness?
A4: Balances mechanical strength (for handling) with thermal conductivity, optimal for rapid thermal processing.


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