Sign In | Join Free | My benadorassociates.com
benadorassociates.com
Products
Search by Category
Home > Water Sports >

Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

Categories Semiconductor Cleaning Machine
Brand Name: Jietai
Model Number: JTM-100504AD
Certification: CE, FCC, ROHS, etc.
Place of Origin: Dongguan, Guangdong
MOQ: 1
Price: ¥800000
Payment Terms: T/T
Supply Ability: One unit. It will take 30 to 60 days.
Delivery Time: 30-60work days
Packaging Details: Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.8M
Type: Ultrasonic alkaline washing+Ultrasonic acid washing+Pure water rinsing
Name: Semiconductor Cleaning Machine
Model: JTM-100504AD
Overall Dimensions: 12M*2M*2.8M
Cleaning Frequency: 40KHZ/80KHZ
Power: 120KW
Cleaning temperature: 60℃
Number of Tanks: 10
  • Haven't found right suppliers
  • Our buyer assistants can help you find the most suitable, 100% reliable suppliers from China.
  • And this service is free of charge.
  • we have buyer assistants who speak English, French, Spanish......and we are ready to help you anytime!
Submit Buying Request
  • Product Details
  • Company Profile

Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

Product Introduction: Semiconductor Silicon Wafer Cleaner
A precision-engineered solution for semiconductor manufacturing, this ultrasonic cleaning system integrates multi-stage processes to achieve sub-micron level surface purity on silicon wafers—critical for maintaining device performance in advanced node fabrication (down to 5nm).
Sequential Cleaning Stages:
  • Ultrasonic Alkaline Scrubbing: Employs 40KHz-80KHz ultrasonic cavitation in alkaline bath to decompose organic contaminants, strip photoresist residuals, and dislodge macro-particles (≥1μm) from wafer surfaces and via structures. The frequency-tunable ultrasonic energy ensures uniform cleaning across 4"-12" wafer diameters, including edge exclusion zones.
  • Ultrasonic Acid Etching: Utilizes the same frequency range in acidic media to dissolve inorganic impurities—specifically metal ions (Fe, Cu, Zn) and native oxide layers (SiO₂). Cavitation micro-jets penetrate patterned features to remove embedded sub-100nm contaminants, validated by particle counter readings (≤10 particles/wafer for ≥0.1μm).
  • UPW Rinsing: Final rinse with ultra-pure water (UPW, TOC ≤5ppb) flushes residual chemistries, achieving surface resistivity ≥18.2MΩ·cm—meeting SEMI F20 standards for pre-deposition cleaning.
Process Parameters:
  • Frequency Band: 40KHz-80KHz (multi-frequency operation, selectable via HMI for contamination-specific tuning)
  • Temperature Setpoint: 60℃ (PID-controlled, ±1℃ tolerance) to optimize chemical reaction kinetics without inducing wafer warpage.
  • Material Compatibility: Wetted components in PFA (perfluoroalkoxy) and sapphire to prevent metallic ion leaching, ensuring zero cross-contamination.
Fab Integration Advantages:
  • Compatible with FOUP/SMIF pod loading for automated cassette handling, reducing human intervention
  • Cleanroom-class design (ISO 5) with HEPA-filtered exhaust to maintain Class 1 environment compliance
  • Recipe storage for 50+ cleaning protocols, adaptable to bare wafers, SOI wafers, and epi-wafers
Application: Essential for pre-litho, post-CMP, and post-etch cleaning in logic, memory, and MEMS fabrication lines.
Keywords: Semiconductor wafer ultrasonic cleaner, alkaline-acid sequential cleaning, UPW rinsing, 40-80KHz, 60℃ process, sub-micron decontamination

Buy Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃ at wholesale prices
Send your message to this supplier
 
*From:
*To: guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
*Subject:
*Message:
Characters Remaining: (0/3000)
 
Inquiry Cart 0