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Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications

Ⅰ. Core Technical Specifications

Parameter Category	Details
Substrate Capacity	Max size: Up to 6-inch (150mm); Compatible with 2"/4"/6" wafers/optical components; Min size: 10×10mm
Vacuum Performance	Ultimate vacuum: ≤ 1×10⁻⁶ Torr (1.3×10⁻⁴ Pa); Pumping time: mins to 5×10⁻⁶ Torr; Leak rate: ⁻³ Pa·L/s (He leak test)
Evaporation System	Electron beam power: 250W-10kW; Number of crucibles/pockets: 4-8; Supports rod (max φ4mm) & crucible (1-15cc) feedstock
Process Control	Substrate temperature: RT-500℃ (±1℃ precision); Rotation speed: 2-20 rpm; Film thickness monitor: QCM (0.01 nm/s resolution)
Film Quality	Uniformity: ±1%-±3%; Adhesion: Meets ASTM D3359 4B standard; Deposition rate: 0.1-10 nm/s
Compatibility	Materials: Au, Ag, Pt, W, SiO₂, TiO₂, MgF₂, YF₃, ZrO₂ (supports AR/AF/reflective films)
Physical Dimensions	Footprint: 1-3.3×3.0m; Height: 2.5-3.5m; Weight: <800kg (desktop/tabletop models)
Power Supply	Single/Three-phase: 220V/380V, 50/60Hz; Power consumption: 1.2kW-10kW

Ⅱ. Key Selling Points

1. Compact & Space-Saving Design

◦ Desktop/modular structure with Korvus HEX-800 standard), ideal for laboratory/research settings; easy integration with glove boxes for inert-atmosphere processes.

◦ Lightweight construction () and tool-free module replacement reduce installation & maintenance costs.

1. High-Precision & Reliable Coating

◦ Electron beam focusing technology enables deposition of refractory metals (Pt, W) and dielectric materials with 0.01nm/s thickness control; film uniformity ±1% (industry-leading for small-scale equipment).

◦ Hall ion source + Ar plasma pre-cleaning enhances film adhesion (4B grade) and density, meeting optical component performance requirements (e.g., AR films with >95% transmittance).

1. Versatile & Flexible Process Adaptation

◦ Supports 4-8 crucibles/pockets for multi-material co-evaporation; quick switch between metal, oxide, and organic films (AF/AR/reflective/protective coatings).

◦ Compatible with 2"-6" substrates (wafers, lenses, optical fibers) and customizable fixtures (dome/knudzin/plate) for 2D/3D components.

1. Intelligent & User-Friendly Operation

◦ PLC + touchscreen control system with real-time process monitoring (vacuum level, deposition rate, temperature); pre-programmed process libraries for quick setup.

◦ Energy-efficient cryopump/magnetic suspension molecular pump design reduces power consumption by 30% vs. traditional systems.

1. Cost-Effective for R&D & Small-Batch Production

◦ Low initial investment with high target utilization rate (>70%) and minimal material waste; suitable for prototyping to small-batch manufacturing (up to 10,000 pieces/year).

◦ Multi-functional integration (e-beam evaporation + sputtering optional) eliminates need for multiple devices, lowering total ownership cost.

I. Core Functions

The core functions of the small electron beam evaporation coating machine revolve around the deposition of high-purity and highly controllable films, which can be specifically classified into the following categories:

Precise heating and evaporation function

High-energy electron beams are used to bombard the surface of the target material, heating it to a molten or evaporated state, and the atoms/molecules of the target material escape in gaseous form. Compared with resistance heating, electron beam heating features concentrated energy and high thermal efficiency, enabling the evaporation of refractory materials such as tungsten, molybdenum, titanium, SiO₂, and TiO₂, and avoiding contamination of the target material by the heating source.
Supports multi-target material switching (usually equipped with 2 to 6 crucible positions), enabling continuous deposition of single-layer and multi-layer films, and meeting the preparation requirements of composite film layers.

Precise control function of film thickness

It is equipped with a built-in quartz crystal film thickness monitor, which can monitor the deposition rate and thickness of the film layer in real time. The control accuracy can reach the nanometer level (usually ±0.1nm), and it can prepare ultra-thin functional films (such as optical anti-reflection films and metal conductive films of tens of nanometers).
Equipped with a programmable control system, it can preset deposition parameters (electron beam power, vacuum degree, deposition rate), achieving automated coating and ensuring the consistency of batch film layers.

High vacuum environment guarantee function

Equipped with a mechanical pump + molecular pump vacuum unit, the vacuum degree of the cavity can be reduced to a high vacuum environment of 10⁻⁴~10⁻⁶ Pa, reducing the scattering and contamination of gas molecules on evaporated particles, and ensuring that the film layer has high purity, good density and strong adhesion.

Small-sized workpiece adaptation function

Designed for small workpieces, the workpiece table is mostly rotary (to improve the uniformity of the coating layer), suitable for substrates with sizes typically ranging from a few millimeters to tens of millimeters (such as wafers, optical lenses, chips, sensor components), and supports coating of surface mount, sheet, and small parts.

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Categories	Optical Electron Gun Coating Machine
Brand Name:	Lion King
Certification:	CE
Place of Origin:	Guangdong
MOQ:	1
Delivery Time:	45-60 work days
Control System:	Full Auto, Semi Auto, Manual
Coating Process:	Vacuum Evaporation
Rotation Stand:	2 Sets
Server:	openresty
Dimensions:	Approx. 2000mm x 1500mm x 1800mm
Cooling Method:	Water Cooling
Coating Transparency:	High
Coating Thickness:	Adjustable
Chamber Material:	Stainless Steel Or Carbon Steel
Pumptype:	Rotary vane pump + diffusion pump
Voltage:	380V, 50Hz or Custom Made
Coating Technology:	Evaporation
Coating Temperature:	adjustable
Evaporation Power Supply:	1 Set
Rotation System:	2 Sets