2-Inch C-Plane Sapphire Substrate for Process Development & Equipment Calibration

Product Overview

This 2-inch C-plane sapphire substrate is manufactured from high-purity single-crystal aluminum oxide (Al₂O₃) using advanced crystal growth and precision slicing techniques. Featuring a Single-Side Polished (SSP) surface, stable thickness, and low bow control, this substrate is ideal for equipment calibration, thin-film deposition trials, and non-critical semiconductor or photonics R&D.
Each wafer undergoes strict dimensional and visual inspection, and all shipments include full batch traceability.

Key Features

• High-Purity Sapphire (Al₂O₃): Excellent mechanical strength, thermal stability, and chemical resistance.

• C-Plane (0001) Orientation: Standard orientation for GaN, optical coatings, and laser applications.

• SSP Surface: Polished front side ensures uniform deposition; backside lapped for stable fixture handling.

• Low Bow <10 µm: Maintains flatness for reliable processing.

• Dummy Grade: Cost-effective for process experiments and equipment tuning.

• Strict Quality Control: Batch No. and Lot No. provided for full traceability.

Technical Specifications

Applications

This dummy-grade sapphire substrate is suitable for:

• Deposition trials (ALD / PVD / CVD / MOCVD)

• Equipment calibration and parameter tuning

• Coating uniformity and process evaluation

• Thin-film R&D and non-critical photonics experiments

• University training and laboratory teaching

• Optical testing and functional demonstration setups

Packaging & Quality Assurance

• Class 100 cleanroom inspection and handling

• 25 pcs per wafer cassette with protective separators

• Vacuum-sealed, anti-static packaging to prevent contamination

• Lot and batch labels included for full traceability

• Visual defect screening before shipment

FAQ

1. What is the main difference between dummy-grade and prime-grade sapphire substrates?

Dummy-grade substrates have correct mechanical dimensions but may not meet the optical, surface defect, or epi-ready standards required for GaN growth or device manufacturing. They are ideal for process testing and calibration.

2. Can I use this substrate for epitaxial growth?

For general process verification, yes.
However, for high-quality GaN or epitaxial device fabrication, we recommend switching to prime-grade or epi-ready DSP sapphire for better flatness, TTV, and surface defect control.

3. Do you offer customized orientation, thickness, or polishing?

Yes. We support custom:

• Thickness (200–1500 µm)

• SSP / DSP

• C-plane, A-plane, R-plane, M-plane

• Laser marking, orientation flats, custom chamfering
  Please contact us with your specifications.

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