3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Bright Rotatable Molybdenum Sputtering Target 99.5%
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Molybdenum Rotatable Sputtering Target Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: 99.95% Molybdenum Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets......
Luoyang Hypersolid Metal Tech Co., Ltd
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Metallic Pure Polished Molybdenum Sputtering Targets
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99.95% Pure Polished Molybdenum Round Target Description Pure Molybdenum Round Target, also known as molybdenum sputtering target, can be divided into two types, that is, molybdenum planar target and molybdenum rotary target. Features of Molybdenum Round Target 1. Thin-film deposited from molybdenum sputtering target is high in density and adhesion; 2. Molybdenum......
JINXING MATECH CO LTD
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Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc
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... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,...
Shaanxi Peakrise Metal Co.,Ltd
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99.99% Purity Titanium Sputtering Targets For Pvd Coating Machine
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99.99% High Purity Titanium Sputtering Targets factory for pvd coating machine 1. High purity titanium sputtering targets Product name Titanium Sputtering Targets for pvd coating machine Grade Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc. Origin Baoji city, Shaanxi Province,hina Titanium content ≥99......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Photoelectron Semiconductor Molybdenum Sputtering Target
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1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610°C Boiling Point:5560°C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting point, High-density, high temperature oxidation ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum......
Baoji City Changsheng Titanium Co.,Ltd
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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum......
Shaanxi Peakrise Metal Co.,Ltd
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99.99% SiO2 Silicon Dioxide Sputtering Target Frosting Surface High Chemical Purity
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99.99% SiO2 Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special ......
Yantai ZK Optics Co., Ltd.
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High Conductivity 99.97 Percent Copper Target 155OD*125ID*888 Copper Tube Vacuum Package
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... Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under...
Baoji Feiteng Metal Materials Co., Ltd.
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