Titanium Ti Ti-Al Zr Cr Sputtering Target Disc For PVD Coatiing
|
Description PVD (Physical Vapour Deposition) sputtering targets are source materials used to deposit thin films on substrates through the sputtering process. These targets are made by processing high-purity metals or ceramics using advanced technologies......
Baoji City Changsheng Titanium Co.,Ltd
|
PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating
|
Product Information: Name PVD coating tantalum target Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 Purity ≥99.95% Density 16.68g/cm3 Surface Machined surface, no pits, scratches, stains, burrs and other defects Standard ASTM B708 Shape Flat target, Rotating ......
Shaanxi Peakrise Metal Co.,Ltd
|
16.6g/Cm3 Pure Tantalum Sputtering Target Excellent Acid Resistance
|
tantalun target purity 99.95% customizable commodity outlet FeatureTM B708 tantalum sheet price per kg 1. Good ductility 2. Good plasticity 3. Excellent acid-resistance 4. High melting point, high boiling point 5. Very small coefficients of thermal ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
|
High Purity Titanium Aluminum Sputtering Targets TiAl7030
|
... Features Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application. Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%...
JINXING MATECH CO LTD
|
Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine
|
...Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine Product Details: Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al......
Baoji Lihua Nonferrous Metals Co., Ltd.
|
Tantalum Sputtering Coating Machine
|
Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to ......
SHANGHAI ROYAL TECHNOLOGY INC.
|
Customized Aluminum Sheets Metal Al Sputtering Target 0.2mm 7075
|
Aluminum Sheet Customized Aluminum Sheets Metal Aluminum Price Al Sputtering Target Applications of 7075 Aluminum Type 7075 aluminum is one the strongest aluminum alloys. Its high yield strength (>500 MPa) and its low density make the material a fit for ......
Wuxi Cheng Yue Metal Materials Co., Ltd.
|
NI 200 Nickel Alloys Sputtering Target Pure Nickel Alloy Nickel-Based Alloy
|
Overview Essential details Place of Origin: China Type: Nickel Plate Application: electrical and electronic components Grade: monel Ni (Min): 63 Resistance (μΩ.m): Customzied Powder Or Not: Not Powder Ultimate Strength (≥ MPa): 517-655 Elongation (≥ %): 50......
TOBO STEEL GROUP CHINA
|
99.95% Min Purity Thermocouple Use Tantalum Products
|
... 5. Application Capacitors, high-temperature furnace parts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. 7....
Zhengzhou Sanhui Refractory Metal Co., Ltd.
|
Small Scanning Electron Microscope Ion Sputtering Device Target For Au Ag Cu Al
|
Ion Sputtering instrument , SBC-12 , Target available for Au , Ag , Cu , Al This device is primarily designed for coating of conductive films on SEM samples.Easy operation, cost-effectiveness, androbust durability, making it an indispens able tool for ......
KYKY TECHNOLOGY CO., LTD.
|
Submit your “al 35 tantalum sputtering target” inquiry in a minute :