Zn Zinc Sputtering Target Material With Excellent Electrical Conductivity
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...zinc, the Zn target are utilized for sputtering or evaporation deposition. With excellent electrical conductivity, stable chemical properties, and superior film deposition performance, it can form dense and uniform films on various substrates and is an important functional material in fields such as optoelectronics, semiconductors, construction, and automotive. Excellent Features of Zinc Target......
Shenzhen APG Material Company Limited
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High Purity Titanium Aluminum Sputtering Targets TiAl7030
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... Features Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application. Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%...
JINXING MATECH CO LTD
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Titanium Ti Ti-Al Zr Cr Sputtering Target Disc For PVD Coatiing
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... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and shapes. Each target is fabricated according to the...
Baoji City Changsheng Titanium Co.,Ltd
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Samarium Sputtering Target for High-Reflectivity Metal Films & Transparent Conductive Coatings
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...sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal films, semiconductor films, and special functional coatings. The product is made from high-purity samarium metal through precision melting, forming, and processing. It features a high melting......
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Frosting Silicon Dioxide Sputtering Target 1100Mpa High Corrosion Resistance
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Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1,713 °C (3,115 °F; 1,986 K) Boiling point:2,950 °C (5,340 °F; 3,220......
Yantai ZK Optics Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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High Purity Planar Molybdenum Sputtering Target Plate Silver Color
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...Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and barrier layer materials for semiconductors. These are based on molybdenum's high melting......
Luoyang Hypersolid Metal Tech Co., Ltd
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99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
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...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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Vacuum Packaging 99.95% Tungsten Products Sputtering Target Vacuum Coating
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...Sputtering Target Description: Tungsten sputtering target is a product made of pure tungsten powder as raw material. It has a silvery white appearance and is popular in many fields because of its excellent physical and chemical properties. Specifications: Material Type Tungsten Symbol W Atomic Weight 183.84 Atomic Number 74 Color/Appearance Grayish White, Lustrous, Metallic Thermal Conductivity 174 W/m.K Melting......
Zhenan Metallurgy Co., Ltd
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