99.95% High Purity Molybdenum Targets For Sputtering Coating
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...molybdenum sputtering targets bond with back plate for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension as T*3340*3340 4. wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum......
Fonlink Photoelectric (Luoyang) Co., ltd
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Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc
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... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,...
Shaanxi Peakrise Metal Co.,Ltd
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PVD Arc Ion Molybdenum Tungsten Alloy Plate Target For Magnetron Sputtering Coating
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...Molybdenum Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum alloy plate target is a high-purity tungsten and molybdenum alloy material, which is widely used in various thin film deposition technologies. Below I will give you a detailed introduction to the specifications, technical parameters and uses of tungsten-molybdenum......
Shaanxi Peakrise Metal Co.,Ltd
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Diameter 5mm -100mm Non Ferrous Metals Molybdenum Disk Cold Rolled Surface
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...Mm Molybdenum Disk Cold Rolled Surface Molybdenum Disk used in Electronics and information industry, such as integrated circuit, information storage, LCD, laser memory, electronic controller,etc; It can also be used in the field of glass coating; It can ......
Luoyang Hypersolid Metal Tech Co., Ltd
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum. Item Purity Density Coating......
Baoji City Changsheng Titanium Co.,Ltd
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High Purity Molybdenum Tube Sputtering Targets Rotating Targets With 3000mm Length
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...molybdenum rotary target. Molybdenum target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, ion coating and other industries. It is suitable for all planar coating and rotary coating systems....
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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PVD Thin Film Coating Molybdenum Sputtering Targets
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... melting point, High-density, high temperature oxidation resistance, long service life, resistance to corrosion. The melting point of coated molybdenum sputtering target is...
JINXING MATECH CO LTD
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Titanium Material Targets Disk Titanium Discs Grade 1 Grade 2 Titanium Alloy for Coating
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... in the physical vapor deposition (PVD) process, specifically used in sputtering to create thin coatings on various substrates. These targets are typically made from titanium (Ti) or titanium alloy (such as TiAl for titanium-aluminum alloys), which are...
Baoji Lihua Nonferrous Metals Co., Ltd.
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ASTM Sputtering Molybdenum Tube Target Titanium Seamless Pipe Corrosion Resistance
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Titanium Tube Target Titanium TA2 ASTM B861-06 a 133OD*125ID*2644L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2644 Grade TA2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port......
Baoji Feiteng Metal Materials Co., Ltd.
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