Silicon Carbide Sputtering Targets(SiC Sputtering Target)
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Silicon Carbide Sputtering Targets are manufactured from high-purity powders, offering excellent resistance to high temperatures and corrosion, alongside superior chemical stability and thermal ......
Shenzhen APG Material Company Limited
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Frosting Silicon Dioxide Sputtering Target 1100Mpa High Corrosion Resistance
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Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (......
Yantai ZK Optics Co., Ltd.
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Aluminum Silicon Alsi Sputtering Targets 90:10 / 80:20 At% Evaporation Material
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...Silicon Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets......
JINXING MATECH CO LTD
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Titanium Ti Ti-Al Zr Cr Sputtering Target Disc For PVD Coatiing
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... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and shapes. Each target is fabricated according to the...
Baoji City Changsheng Titanium Co.,Ltd
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99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
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...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target......
Baoji Lihua Nonferrous Metals Co., Ltd.
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High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication
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...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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High Purity 90% Silicon Carbide 1-3mm Granules for Steel Plant Deoxidation and Refractory Applications
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... ensure a high surface area for immediate reaction during ladle furnace (LF) processing. Superior Recovery Rates: Achieve over 94% Silicon and 90% Carbon yield, reducing the...
Zhenan Metallurgy Co., Ltd
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