Frosting Silicon Dioxide Sputtering Target 1100Mpa High Corrosion Resistance
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Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (......
Yantai ZK Optics Co., Ltd.
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Aluminum Silicon Alsi Sputtering Targets 90:10 / 80:20 At% Evaporation Material
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...Silicon Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets......
JINXING MATECH CO LTD
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Titanium Target Silicon Sputtering Target Gr5 Gr7 Pvd Coating Machine For PVD Vacuum Coating Machine
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...our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to...
Baoji Lihua Nonferrous Metals Co., Ltd.
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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High Purity Sputtering Targets For Thin Film Deposition With Precise Control
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... that the target stays in place during the sputtering process, resulting in a high-quality output. The Metal Sputtering Target is made with 99.99% purity, ensuring that it is free from impurities that may affect the quality of the output. This makes it...
Baoji City Changsheng Titanium Co.,Ltd
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc
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... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,...
Shaanxi Peakrise Metal Co.,Ltd
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High Grade Precipitated Silicon Dioxide Cas Number 7631 86 9 Thickening For Polar Liquid
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...Silicon Dioxide CAS No.:7631-86-9 Used For Rubber Product Description: The silicon dioxide used in toothpaste is the powder without fixed model. No smell, no dissolved in water and acid, no chemical reaction with other chemical element, compatible with the fluorid and other materials of toothpaste are the features of this sort of silicon dioxide. Specifications of Silicon Dioxide......
Guangzhou Quanxu Technology Co.,Ltd.
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