Pipeline Steam Purge Test Sputtering Steam Blowing Target Plate Aluminum
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... are not suitable for steam purging because heat expansion and other issues are not considered in the design. 2. The steam purge should be purged with a large flow of steam, and the flow rate should not be less than 30m/s. 3. Before steam purging, the...
Hebei Zexu Pipe Manufacturing Co., Ltd.
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Ni Sputtering Target, Ni Sputter Target, Ni Target, Nickel Sputtering Target, Nickel Sputter Target, Nickel Target
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...Sputtering Target, Ni Sputter Target, Ni Target, Nickel Sputtering Target, Nickel Sputter Target, Nickel Target Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999% Shape: Discs, Plates, Column Targets, Step Targets, Custom-made Material: nickel chrome/chromium, NiCr80/20wt% Size: customized Application: PVD coating High-quality Pure Nickel Sputtering Target......
JINXING MATECH CO LTD
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high ......
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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High Purity Cr Chromium Sputtering Target Plate Shape For PVD Coating Machine
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Description Sputtering targets are materials from which thin films are grown by a sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities, and......
Baoji City Changsheng Titanium Co.,Ltd
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High Purity Planar Molybdenum Sputtering Target Plate Silver Color
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High Purity Molybdenum Planar Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and ......
Luoyang Hypersolid Metal Tech Co., Ltd
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99.95% High Purity Molybdenum Targets For Sputtering Coating
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...sputtering targets bond with back plate for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension as T*3340*3340 4. wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum targets......
Fonlink Photoelectric (Luoyang) Co., ltd
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3N5 127*458*10mm Chromium Sputtering Target Plate Shape
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Chromium Tube Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium plate target Size 127*458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port ......
Baoji Feiteng Metal Materials Co., Ltd.
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75mm Gold Plating Sputtering Coating Vacuum Metallizing Machine
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...plating machine Patented cathode structure design, multi-section gas path control technology and constant pressure control gas volume, can achieve stable control of magnetron sputtering rate, using online real-time monitoring of film thickness design, to ensure the uniformity of the reaction film of various gases. Advantages 1. 8 targets......
Hefei Dongsheng Machinery Technology Co., Ltd
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Polished Titanium Sputter Target / Vacuum Coating Titanium Target
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.../Gr5/Gr7/Gr9/Gr12 Origin Baoji city Shaanxi Province china shape Round target / plate target / tube target Titanium content ≥99.6 (%) Impurity content <0.02 (%) Density 4.51 or 4.50 Standard ASTM B381 Size 1.Diameter 98mm ......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Round Tungsten Sputtering Target For Magnetron Sputtering Coating Tungsten Disc Tungsten Target Tungsten Round Stock
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Tungsten Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, ......
Shaanxi Peakrise Metal Co.,Ltd
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