thin film deposition lpcvd oxidation furnace

...LPCVD Oxidation Furnace 6inch 8inch 12inch LPCVD Oxidation Furnace for Uniform Thin-Film Deposition LPCVD (Low Pressure Chemical Vapor Deposition) systems serve as critical thin-film deposition equipment in semiconductor manufacturing, primarily employed for growing polysilicon, silicon nitride, and silicon oxide films. The technology's key advantages include: 1) Low-pressure environment (0.1-10 Torr) ensuring exceptional film...

..., supports various oxidation, annealing, and LPCVD processes. The system features a 21-cassette automatic transfer with seamless MES integration, ideal for semiconductor manufacturing. Working Principle The furnace features a vertical tube structure and...