Pure Zirconium Sputtering Target Low Density Good Thermal Properties
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...zirconium sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear resistance, excellent processing performance, non-toxic,non-magnetic, compared with traditional stainless steel, copper, nickel, titanium and other metal alloys, zirconium and zirconium......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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... 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium alloy......
Gnee Steel (tianjin) Co., Ltd.
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6.52 G/Cm3 Zirconium Sputter Target , Cylindrical Targets
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Zirconium Sputtering Targets, High Quality Cylindrical Targets Zirconium Sputtering Targets Description Zirconium Sputtering Targets (Zr) is a silver metal with a density of 6.52 g/cm3. Zirconium has a very small neutron adsorption cross section and relatively high melting point (1855°C or 3371°F), making it an excellent material for nuclear power rods. Zirconium sputtering targets......
JINXING MATECH CO LTD
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Gr1 Gr2 Pure Titanium Target Disc Sputtering Target High Density
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high quality pure titanium Gr1 Gr2 titanium disc sputtering target The target material is the target material bombarded by high-speed charged particles. There are metals, alloys, oxides, etc. Replace different target materials (such as aluminum, copper, ......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum. Item Purity Density......
Baoji City Changsheng Titanium Co.,Ltd
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Frosting Silicon Dioxide Sputtering Target 1100Mpa High Corrosion Resistance
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...Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1,713 °C (3,115 °F; 1,986 K) Boiling point:2,950 °C (5,340 °F; 3,220 K) Magnetic susceptibility (χ):−29.6·10−6 cm3/mol Thermal conductivity:12 (|| c-axis), 6.8 (⊥ c-axis), 1.4 (am.) W/(m⋅K)(p12.213) Refractive index (nD):1.544 (o), 1.553 (e)(p4.143) Advantage: 1.Very Low...
Yantai ZK Optics Co., Ltd.
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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Low Density High Strength PVD CVD Gr1 Ti Tube Target
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Titanium Tube Target Vacuum Coating Target Titanium Gr1 ASTM B861-06 a 133OD*125ID*840 Item name Titanium tube target Size φ133*φ125*840 Grade Gr1 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port......
Baoji Feiteng Metal Materials Co., Ltd.
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20mm Molybdenum Sputtering Targets For The Semiconductor Industry Molybdenum Target Molybdenum Disc molybdenum products
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...Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets......
Shaanxi Peakrise Metal Co.,Ltd
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