indium tin metal sputtering targets

Categories:Metal Sputtering Target

Country/Region:china

...applications and compatible with customized substrates. Our Metal Sputtering Target product is bonded with Indium, ensuring a strong and secure bond that lasts even under the most demanding conditions. This makes it ideal for use in a variety of settings,

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

Ultra high purity tungsten alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic ...

Brand Name:GNEE

Model Number:TiP0001

Place of Origin:Henan

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ...

Brand Name:ZMSH

Model Number:ITO glass

Place of Origin:CHINA

...indium tin oxide glass for Lab Use10x10mmx0.7mm 8 ohm/sq ITO glass, Indium-tin Oxide (Indium-Tin oxide) transparent conductive film glass, is on the basis of sodium calcium or borosilicate substrate glass, the use of magnetron sputtering method coated with a layer of Indium Tin...

Brand Name:ROYAL

Model Number:RT-R2R-SP

Place of Origin:Made in China

Indium-Tin-Oxide Coating, ITO-Coatings on High Quality PET Substrates, ITO Think Film Vacuum Coating Equipment​ PET ITO Thin Film Vacuum Coating Equipment is with the magentron sputtering technology to generate high transparent ITO film on glass and PET ...

Brand Name:FUNSONIC

Model Number:FSY-2010-PL

Place of Origin:CHINA

Indium Coating Machine Target Welding Machine 20Khz Metal and Non Metal Surface Coating Indium Technology Description: Indium coating machine, also known as target welding machine, is a traditional technique for manually coating indium on metal and non-metal...

Brand Name:ZMSH

Place of Origin:China

.... ITO is a highly transparent conductive oxide with excellent optical transparency and electrical conductivity. The preparation process usually adopts magnetron sputtering, vacuum evaporation or chemical vapor deposition to form a

Brand Name:JXS

Place of Origin:China

Foshan JXS ITO Indium Tin Oxide Magnetron Sputtering Coating Line Description:The PVD vacuum coating machine is a sophisticated piece of equipment utilized in the field of surface engineering. It employs physical vapor deposition techniques to deposit a t...

Categories:Sputtering Target

Country/Region:china

... ytterbium metal through precision processing, featuring excellent film uniformity, high conductivity, and good sputtering stability. It can replace traditional magnesium and silver cathode materials to improve display device performance and lifespan.

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:PRM

Model Number:custom

Place of Origin:China

...Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets...

Brand Name:Hypersolid Metal

Place of Origin:China

... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The

Categories:oxide metal and others targets

Country/Region:china

Chemical Formula In2O3/SnO2 Relative Density >=99.5% Crystal Particle Size 5~15µm Electrical Resistivity 0.1×10-3Ω·cm (High Density) Linear Thermal Expansion 8.2×10-3K-1 Purity >=99.99% Appearance Black (High Density)

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port...

Place of Origin:Zhaoqing, Guangdong

Brand Name:Zhongda

...Sputtering Chamber Size Can Be Customized According to Details Requirement Application Sanitary Ware, Car Wheel, Hard Ware, Cutleryetc Coating Color Golden, Rose Gold, Black, Blue, Rainbow Color, etc Coating Film Tin, Tic, Ticn, Tialn, Crn, Cu, etc Sputtering Target...

Model Number:Customized

Place of Origin:China

Brand Name:Sanhui

..., lustrous, hard, and brittle metal known for its high mirror polish and corrosion resistance. It has a melting point of 1,857°C, a density of 7.2 g/cc, and a vapor pressure of 10-4 Torr at 1,...

Brand Name:Sifon

Model Number:5mm*W*L

Place of Origin:China

...wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum targets are our best advantaged products. We can make as big dimension as T