magnetron sputtering coating system

Brand Name:JXS

Place of Origin:China

....This machine operates based on the principle of magnetron sputtering. It uses a magnetron to generate a strong magnetic field that confines and accelerates electrons, which bombard a target material (such as a metal or a compound). The impact of the

Brand Name:ROYAL

Model Number:RTAS1215

Place of Origin:Made in China

coated on microwave wireless communication chip Cooper Magnetron Sputtering Coating Plant Cooper Magnetron Sputtering Coating Plant on Ceramic Radiating Substrate The DPC process- Direct Plating Copper is an advanced coating technology applied with LED / semiconductor / electronic industries. One typical application is Ceramic Radiating Substrate. Cooper conductive film deposition on Al2O3, AlN, Si, Glass substrates by PVD vacuum sputtering

Brand Name:Lion King

Place of Origin:Guangdong

...molecular pumps, etc., it can evacuate the coating chamber to a high vacuum state, providing the required vacuum environment for magnetron sputtering coating 2.Magnetron sputtering system : Including magnetron sputtering cathodes, targets, etc. 3.Automatic...

Brand Name:HJ

Model Number:KSL-1200

Place of Origin:China

...Magnetron Sputtering Coating Machine 0~60RPM Vacuum Coating Machine KSL-1200​ Application Scope with Vacuum Coating Machine: The shell of various electrical appliances and intelligent terminals, such as computers, mobile phones, and home appliances. It can coat metal films, transparent films, non-conductive films, electromagnetic shielding films, etc. Product Features with Vacuum Coating Machine: Magnetron Sputtering Coating...

Brand Name:PRM

Model Number:custom

Place of Origin:China

...Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets are also used in the microelectronics industry, for example to form coatings...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Tungsten-Molybdenum Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum alloy plate ...

Brand Name:GVAC

Brand Name:DST

Model Number:MOP

Place of Origin:China

...tem, a control system, etc., and can achieve copper, lead, aluminum, tin, silver, etc. sputtering on thin films with a thickness of 2 μm to 300 μm. Can be accurately coated on the surface of various coils such as film, cloth, sponge, copper foil, paper,

Brand Name:west

Model Number:Magnetron Sputter Car Window Film Series

Place of Origin:China

Product Overview The Magnetron Sputter Car Window Film from Westglass utilizes advanced magnetron sputtering coating technology, depositing multiple layers of nanoscale ceramic coatings onto a PET substrate via high-energy ion bombardment. Its core ...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:KDPPF 5STAR

Model Number:MS

Place of Origin:CHINA

...Magnetron Sputtering Film for Car Window Tint Product Description: The Magnetic Sputtering Series is an ideal choice for researchers and scientists who require high-quality thin films for their research and development projects. It provides a reliable and efficient solution for thin film deposition in various applications such as magnetic recording media, magnetic sensors, and magnetic storage devices. The Magnetic Sputtering

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

...'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Size φ133*φ125*2940(include flange) The coating target material is a sputtering source which can form various functional films on the substrate by

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

Sputtering Target Silver Sputtering Target Titanium Disc to High Purity Sputtering in Medical Applications In the realm of Physical Vapor Deposition (PVD) processes, titanium sputtering targets are critical in the production of thin films used in various ...

Model Number:Tungsten Target

... is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure, and fine grain; 3. Our tungsten sputtering target has been

Place of Origin:China

Main technical indexes: 1. ultimate vacuum: ≤6.6X10³Pa 2. vacuum acquisition system adopts molecular pump + mechanical pump unit 3. continuous pumping for 30 minutes, the vacuum degree is less than or equal to 8x10³Pa 4. cylindrical sputtering targets can ...

Categories:Metal Sputtering Target

Country/Region:china

Product Description: The Metal Sputtering Target is bonded using indium, which results in a strong and durable bond. This bond makes it possible to achieve high deposition rates and uniform film thicknesses, which are essential for the production of high-...

Brand Name:Sifon

Model Number:5mm*W*L

Place of Origin:China

high purity molybdenum sputtering targets bond with back plate for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension as T*3340*...

Brand Name:wuxi special ceramic

Place of Origin:Made in China

Boron nitride ceramic is particularly well suited as a burning bear material due to its high temperature resistance and its thermal cycling resistance. APPLICATION OF Boron nitride ceramic plate Used to synthesize single semiconductor crystal and III-V ...

Brand Name:XIWUER

Model Number:CT8-2-30kV-1000pF

Place of Origin:XIAN, SHANNXI CHINA

No. Specification Dissipation Withstanding Voltage Insulation Resistance Dimensions (mm) 1 20kV-2000pF ≤0.0040 1.5Ur● 1min ≥1.0 x 105MΩ D:45 | H:19 | L:23 | D:12 | M:5 2 20kV-10000pF ≤0.0040 1.5Ur● 1min ≥1.0 x 105MΩ D:65 | H:15 | L:19 | D:12 | M:5 3 20kV-...