melting zinc sputtering target

Brand Name:APG

Place of Origin:china

...zinc, the Zn target are utilized for sputtering or evaporation deposition. With excellent electrical conductivity, stable chemical properties, and superior film deposition performance, it can form dense and uniform films on various substrates and is an important functional material in fields such as optoelectronics, semiconductors, construction, and automotive. Excellent Features of Zinc Target...

Brand Name:JX

Model Number:High Purity Titanium Aluminum Sputtering Target TiAl7030

Place of Origin:China

... Features Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application. Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%

Brand Name:Changsheng

Model Number:ASME B16.9

Place of Origin:China

... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and shapes. Each target is fabricated according to the

Categories:Sputtering Target

Country/Region:china

...sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal films, semiconductor films, and special functional coatings. The product is made from high-purity samarium metal through precision melting, forming, and processing. It features a high melting...

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1,713 °C (3,115 °F; 1,986 K) Boiling point:2,950 °C (5,340 °F; 3,220...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering

Model Number:Molybdenum Planar Sputtering Targets

...Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and barrier layer materials for semiconductors. These are based on molybdenum's high melting...

Brand Name:LHTI

Model Number:LH-10

Place of Origin:China

...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target...

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...

Brand Name:ZHENAN

Model Number:Tungsten Sputtering Target

Place of Origin:China

...Sputtering Target Description: Tungsten sputtering target is a product made of pure tungsten powder as raw material. It has a silvery white appearance and is popular in many fields because of its excellent physical and chemical properties. Specifications: Material Type Tungsten Symbol W Atomic Weight 183.84 Atomic Number 74 Color/Appearance Grayish White, Lustrous, Metallic Thermal Conductivity 174 W/m.K Melting...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:PRM

Model Number:custom

Place of Origin:China

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...

Brand Name:Yunding

Model Number:YD-090

Place of Origin:Guangdong, China

...Melting Furnace for Foundry Industry Alloys Melting Zinc Tin and Tin-bismuth Alloys Product Overview: Industrial-Grade Stable Melting Performance This industrial electric melting furnace is designed for foundry industry applications, specifically for melting zinc, tin, and tin-bismuth alloys. It features advanced heating technology and precise temperature control, ensuring fast heating, stable melting...

Brand Name:TOBO

Model Number:NI 200

Place of Origin:China

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...

Brand Name:GNEE

Model Number:TiP0001

Place of Origin:Henan

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and ...